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Atomic Layer Deposition

Principles, Characteristics, and Nanotechnology Applications

Language EnglishEnglish
Book Hardback
Book Atomic Layer Deposition Tommi Kaariainen
Libristo code: 04949772
Publishers John Wiley & Sons Inc, June 2013
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerf... Full description
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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

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About the book

Full name Atomic Layer Deposition
Author Tommi Kaariainen, David Cameron, Marja-Leena Kaariainen, Arthur Sherman
Language English
Binding Book - Hardback
Date of issue 2013
Number of pages 272
EAN 9781118062777
ISBN 1118062779
Libristo code 04949772
Publishers John Wiley & Sons Inc
Weight 582
Dimensions 240 x 164 x 25

Categories

Technology, Engineering, Agriculture > Mechanical engineering & materials > Materials science > Engineering applications of surface coatings & films
Technology, Engineering, Agriculture > Electronics & communications engineering > Electronics engineering > Electronic devices & materials
Technology, Engineering, Agriculture > Technology: general issues > Nanotechnology
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