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Sub-Half-Micron Lithography for ULSIs

Name: Sub-Half-Micron Lithography for ULSIs
Brand: Cambridge University Press
SKU: 02018293
Price: 21050 HUF
Availability: InStock
Author: Katsumi SuzukiShinji MatsuiYukinori Ochiai
ISBN: 9780521022347

Katsumi SuzukiShinji MatsuiYukinori Ochiai

Language

English

Book Paperback

Libristo code: 02018293

Publishers Cambridge University Press, November 2005

In semiconductor-device fabrication processes, lithography technology is used to print circuit patte... Full description

Libristo code: 02018293

140 b

21 050 Ft

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In semiconductor-device fabrication processes, lithography technology is used to print circuit patterns on semiconductor wafers. The remarkable miniaturization of semiconductor devices has been made possible only because of the continuous progress in lithography technology. However, for the trend of ever-increasing miniaturization to continue a breakthrough in lithography technology is now needed. This book describes advanced techniques under development in Japan and elsewhere that represent the key to future semiconductor-device fabrication. The background to developments in lithography technology, trends in ULSI technology and future prospects are reviewed, and the requirements that future lithography technology must meet are described. Several important lithography methods, such as deep UV lithography, X-ray lithography, electron-beam lithography, and focused ion-beam lithography are described in detail by experts in each area. The principles underlying each of these methods are illustrated at the beginning of each chapter to help the reader understand the basis of the different approaches.