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Advances in Chemical Mechanical Planarization (CMP)

Language EnglishEnglish
Book Hardback
Book Advances in Chemical Mechanical Planarization (CMP) Suryadevara Babu
Libristo code: 09927831
Publishers Elsevier Science & Technology, January 2016
Advances in Chemical Mechanical Planarization (CMP) provides the latest information on a mainstream... Full description
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Advances in Chemical Mechanical Planarization (CMP) provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The technology has grown to encompass the removal and planarization of multiple metal and dielectric materials and layers both at the device and the metallization levels, using different tools and parameters, requiring improvements in the control of topography and defects. This important book offers a systematic review of fundamentals and advances in the area. Part One covers CMP of dielectric and metal films, with chapters focusing on the use of particular techniques and processes, and on CMP of particular various materials, including ultra low-k materials and high-mobility channel materials, and ending with a chapter reviewing the environmental impacts of CMP processes. Part Two addresses consumables and process control for improved CMP, and includes chapters on the preparation and characterization of slurry, diamond disc pad conditioning, the use of FTIR spectroscopy for characterization of surface processes, and approaches for defection characterization, mitigation, and reduction. Considers techniques and processes for CMP of dielectric and metal filmsIncludes chapters devoted to CMP for particular materialsAddresses consumables and process control for improved CMP

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About the book

Full name Advances in Chemical Mechanical Planarization (CMP)
Language English
Binding Book - Hardback
Date of issue 2016
Number of pages 536
EAN 9780081001653
ISBN 0081001657
Libristo code 09927831
Weight 690
Dimensions 152 x 229 x 30
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